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F Werner; W Stals; R Görtzen; B Veith; R Brendel; J Schmidt

High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells Artikel

In: Energy Procedia, Bd. 8, S. 301-306, 2011, ISSN: 1876-6102, (Proceedings of the SiliconPV 2011 Conference (1st International Conference on Crystalline Silicon Photovoltaics)).

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