@inproceedings{Vermang2011,

title = {Spatially-separated atomic layer deposition of Al2O3, a new option for high-throughput si solar cell passivation},

author = {B Vermang and F Werner and W Stals and A Lorenz and A Rothschild and J John and J Poortmans and R Mertens and R Gortzen and P Poodt and F Roozeboom and J Schmidt},

editor = {IEEE},

doi = {10.1109/PVSC.2011.6186155},

issn = {0160-8371},

year  = {2011},

date = {2011-06-01},

booktitle = {2011 37th IEEE Photovoltaic Specialists Conference},

pages = {001144-001149},

address = {Seattle, WA, USA},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{Schmidt2010,

title = {Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks},

author = {J Schmidt and B Veith and F Werner and D Zielke and R Brendel},

editor = {IEEE},

doi = {10.1109/PVSC.2010.5614132},

issn = {0160-8371},

year  = {2010},

date = {2010-06-01},

booktitle = {2010 35th IEEE Photovoltaic Specialists Conference},

pages = {000885-000890},

address = {Honolulu, HI, USA},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}