Bessel-Beam Direct Write of the Etch Mask in a Nano-Film of Alumina for High-Efficiency Si Solar Cells
authors
Katkus, Tomas and Ng, Soon Hock and Mu, Haoran and Le An, Nguyen Hoai and Stonyt\.e, Dominyka and Khajehsaeidimahabadi, Zahra and Seniutinas, Gediminas and Baltrukonis, Justas and Ul\vcinas, Orestas and Mikutis, Mindaugas and Sabonis, Vytautas and Nishijima, Yoshiaki and Rienäcker, Michael and Römer, Udo and Krügener, Jan and Peibst, Robby and John, Sajeev and Juodkazis, Saulius
Katkus, Tomas and Ng, Soon Hock and Mu, Haoran and Le An, Nguyen Hoai and Stonyt\.e, Dominyka and Khajehsaeidimahabadi, Zahra and Seniutinas, Gediminas and Baltrukonis, Justas and Ul\vcinas, Orestas and Mikutis, Mindaugas and Sabonis, Vytautas and Nishijima, Yoshiaki and Rienäcker, Michael and Römer, Udo and Krügener, Jan and Peibst, Robby and John, Sajeev and Juodkazis, Saulius
journal
Advanced Engineering Materials
Advanced Engineering Materials