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High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells
article
2011
authors
Werner, F. and Stals, W. and Görtzen, R. and Veith, B. and Brendel, R. and Schmidt, J.
journal
Energy Procedia
doi:10.1016/j.egypro.2011.06.140
de
en