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1.

V Steckenreiter; D C Walter; J Schmidt

Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity Artikel

In: AIP Advances, Bd. 7, Nr. 3, S. 035305, 2017.

Abstract | Links | BibTeX

2.

F Werner; J Schmidt

Manipulating the negative fixed charge density at the c-Si/Al2O3 interface Artikel

In: Applied Physics Letters, Bd. 104, Nr. 9, S. 091604, 2014.

Links | BibTeX

3.

H Wagner; T Ohrdes; A Dastgheib-Shirazi; B Puthen-Veettil; D König; P P Altermatt

A numerical simulation study of gallium-phosphide/silicon heterojunction passivated emitter and rear solar cells Artikel

In: Journal of Applied Physics, Bd. 115, Nr. 4, S. 044508, 2014.

Links | BibTeX

4.

F Werner; A Cosceev; J Schmidt

Interface recombination parameters of atomic-layer-deposited Al2O3 on crystalline silicon, Artikel

In: Journal of Applied Physics, Bd. 111, Nr. 7, S. 073710, 2012.

Links | BibTeX

5.

F E Rougieux; B Lim; J Schmidt; M Forster; D Macdonald; A Cuevas

Influence of net doping, excess carrier density and annealing on the boron oxygen related defect density in compensated n-type silicon Artikel

In: Journal of Applied Physics, Bd. 110, Nr. 6, S. 063708, 2011.

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6.

F Werner; B Veith; D Zielke; L Kühnemund; C Tegenkamp; M Seibt; R Brendel; J Schmidt

Electronic and chemical properties of the c-Si/Al2O3 interface Artikel

In: Journal of Applied Physics, Bd. 109, Nr. 11, S. 113701, 2011.

Links | BibTeX

7.

F Werner; B Veith; V Tiba; P Poodt; F Roozeboom; R Brendel; J Schmidt

Very low surface recombination velocities on p- and n-type c-Si by ultrafast spatial atomic layer deposition of aluminum oxide Artikel

In: Applied Physics Letters, Bd. 97, Nr. 16, S. 162103, 2010.

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8.

N P Harder; R Gogolin; R Brendel

Trapping-related recombination of charge carriers in silicon Artikel

In: Applied Physics Letters, Bd. 97, Nr. 11, S. 112111, 2010.

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9.

K Ramspeck; K Bothe; J Schmidt; R Brendel

Combined dynamic and steady-state infrared camera based carrier lifetime imaging of silicon wafers Artikel

In: Journal of Applied Physics, Bd. 106, Nr. 11, S. 114506, 2009.

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10.

K Ramspeck; S Reissenweber; J Schmidt; K Bothe; R Brendel

Dynamic carrier lifetime imaging of silicon wafers using an infrared-camera-based approach Artikel

In: Applied Physics Letters, Bd. 93, Nr. 10, S. 102104, 2008.

Links | BibTeX