@article{Schäfer2021,
title = {Role of oxygen in the UV-ps laser triggered amorphization of poly-Si for Si solar cells with local passivated contacts},
author = {S Schäfer and A Mercker and A Köhler and T Neubert and L Mettner and B Wolpensinger and V Mertens and R Peibst},
doi = {10.1063/5.0045829},
year = {2021},
date = {2021-04-07},
journal = {Journal of Applied Physics},
volume = {129},
number = {13},
pages = {133103},
abstract = {In recent years, poly-Si based passivated contacts elevated the conversion efficiencies of crystalline Si solar cells to levels of 26%abs due to their outstanding electrical surface passivation performance and current transport characteristics. A major associated challenge, however, is the large parasitic light absorption within the doped poly-Si, regardless if the contacts are applied on the front and/or on the rear side of the solar cell. It, therefore, might be beneficial to confine the passivated contacts to local regions underneath the metal contacts. We present an effective and flexible laser-based approach to structure the poly-Si layer after its full-area deposition. Laser pulses with a pulse duration of 9 ps and a wavelength of 355 nm trigger an amorphization of the poly-Si surface. The minimum threshold fluence for amorphization is between 89 and 129 mJ/cm2. The a-Si layer, which is laterally homogeneous and up to (33 ± 4) nm in thickness, works as an etch barrier in an alkaline solution. The most robust barrier corresponding to the maximum thickness of the a-Si layer is found for a fluence of (270 ± 30) mJ/cm2. Besides the impact of the laser fluence on the etch resistiveness of the modified poly-Si layer, we study the role of oxygen during the laser process. We find that oxygen becomes incorporated into the material for certain laser fluences, which results in a more robust etch barrier. The amount of oxygen incorporated is below 3 wt. %. Eventually, we present a phenomenological model of our findings.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
