Spatially-separated atomic layer deposition of Al2O3, a new option for high-throughput si solar cell passivation
authors
Vermang, B. and Werner, F. and Stals, W. and Lorenz, A. and Rothschild, A. and John, J. and Poortmans, J. and Mertens, R. and Gortzen, R. and Poodt, P. and Roozeboom, F. and Schmidt, J.
Vermang, B. and Werner, F. and Stals, W. and Lorenz, A. and Rothschild, A. and John, J. and Poortmans, J. and Mertens, R. and Gortzen, R. and Poodt, P. and Roozeboom, F. and Schmidt, J.